Multi-mode interference coupler

ABSTRACT

A multimode interference (MMI) coupler with an MMI region of curved edges, and a method of design and manufacturing by using a computerized optimization algorithm to determine a favorable set of segment widths for the MMI region for a predefined set of coupler design parameters.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.14/989,850, filed Jan. 7, 2016, now allowed, which is acontinuation-in-part of and claims priority to U.S. patent applicationSer. No. 14/754,306, now U.S. Pat. No. 9,557,486, filed Jun. 29, 2015,each of which is hereby incorporated by reference herein in itsentirety.

TECHNICAL FIELD

The present invention relates to optical multimode interference devicesand particularly to a multimode interference coupler with a multimoderegion with curved edges for improved performance.

BACKGROUND

Multimode interference (MMI) couplers are used for a wide variety ofapplications in photonic integrated circuits (PICs) such as splitters,combiners, and multiplexers. These applications take advantage of thevariability of the refractive index of MIMI material, which can beheated as a means of controlling its behavior.

As one of the basic MMI couplers, a 2×2 3 dB MMI coupler is afundamental building block of photonic integrated circuits (PIC). FIG.1A is a schematic diagram illustrating a conventional 3 dB 2×2 MMIcoupler 100 having an MMI region 111 of a rectangular shape defined by aregion length 112 equal to L_(MMI) and a region width 114 equal toW_(MMI). The coupler 100 may be terminated by two pairs of ports atopposite ends of the MMI region 111, one input pair of a first port 101and a second port 102 at a first end 113 of the MMI region 111, andanother pair of third port 103 and fourth port 104 at a second end 115of the MMI region 111. The operating principle of such a coupler isdefined by well-known MMI self-imaging theory. When a single-modeoptical signal is launched at either the first port 101 or the secondport 102, the 2×2 coupler 100 behaves as a 3 dB power splitter, such asa Y-junction. Under such behavior, the single-mode optical signalpropagates through the MMI region 111, resulting in two imaging modeoptical signals with a 90-degree phase difference to emerge, one at eachof the third port 103 and the fourth port 104. This 90-degree phasedifference between the two output ports is an attractive feature in manyapplications such as broadband switches and coherent communications. Thebroadband wavelength response also makes the 2×2 MMI coupler 100 abetter candidate for directional 3 dB couplers. Each pair of ports (101and 102) or (103 and 104) at either end of the MMI region 111 is spacedapart by a port gap 117 equal to D_(gap). According to MMI self-imagingtheory, D_(gap) must at least be equal to ¼ W_(MMI). In conventionalprior art practice, the region width W_(MMI) and the region lengthL_(MMI) are tuned when designing the 2×2 MMI coupler 100 by finding aself-imaging point that meets a specific desired performance

FIG. 1B illustrates another configuration of a prior art rectangular K×MMMI coupler 200 with a rectangular MMI region 211 for applicationsrequiring more than two ports at either a first end 213 or a second end215 of the MMI region 211. The coupler 200 is terminated by a first setof K ports 201 at the first end 213, and a second set of M ports 202 atthe second end 215, where K and M are integers greater than 0. The K×Mcoupler 200 follows similar operating principles to those known for the2×2 coupler 100 shown in FIG. 1A.

With reference to FIG. 1C, trapezoidal coupler geometry is alsoconventionally used for the MMI region 311. FIG. 1C illustrates a K×MMMI coupler 300 with a trapezoidal MMI region 311 terminated by a firstset of K ports 301 at a first end 313 thereof, and by a second set of Mports 302 at a second end 315 thereof, where K and M are greater than 1.The port positioning in trapezoidal couplers is conventionallydetermined by the self-imaging theory disclosed by Soldano, Lucas B.,and Erik Pennings, in a paper entitled “Optical multi-mode interferencedevices based on self-imaging: principles and applications” published inLightwave Technology, Journal of 13.4, 1995, pages 615-627, which isincorporated herein by reference.

Performance of the aforementioned prior art couplers, in terms ofmetrics, such as insertion losses, phase error and bandwidths, can betuned only by modifying the width value W_(MMI) and length valueL_(MMI), thus leaving little room for design flexibility, in view of thefixed geometry of rectangular and trapezoidal MMI regions. Furthermore,rectangular and trapezoidal MMI region geometries disadvantageouslyintroduce excess loss when coupling light out of the MMI region into awaveguide. In addition, the geometry and symmetry properties of the MMIregion are susceptible to significant deviations from the intendeddimensions as a result of variations in the fabrication process from runto run or even from wafer to wafer in lithography, etching, waferthickness, and the like, thereby undermining the power balance andincreasing the phase error of an optical signal propagating through theMMI region.

Accordingly, there is a need for more flexibility in MMI couplergeometry, providing additional features that can be configured forimproving performance, in terms of lower insertion loss, powerimbalance, phase error, and wider broadband performance, whilemaintaining a small footprint suitable for large-scale photonicintegration.

SUMMARY OF THE INVENTION

Accordingly, the present invention relates to a multimode interferencecoupler comprising: a multimode interference (MMI) region including:first and second region ends separated by a region length along alongitudinal axis, and first and second curved edges between the firstand second region ends, defining the MMI region, which varies in widthalong the region length; at least one port optically coupled to thefirst region end; and at least one port optically coupled to the secondregion end; wherein each of the first and second curved edges includes aplurality of transitions, and varies in slope relative to thelongitudinal axis on each side of each transition; wherein the MMIregion includes a plurality of different widths, perpendicular to thelongitudinal axis, each width corresponding to one of the plurality oftransitions, spaced apart along the region length, defining adjacentsegments; and wherein the first and second curved edges provide gradualtransitions between the different widths.

Another aspect of the present invention relates to a method ofmanufacturing a multimode interference (MMI) coupler comprising: amultimode interference (MMI) region including: first and second regionends separated by a region length along a longitudinal axis, and firstand second curved edges between the first and second region ends,defining the MMI region, which varies in width along the region length,each of the first and second curved edges including a plurality oftransitions and varying in slope relative to the longitudinal axis oneach side of each transition; at least one port optically coupled to thefirst region end; and at least one port optically coupled to the secondregion end, said method comprising: determining the first and secondcurved edges for a predefined set of design parameters, using acomputerized optimization algorithm; and fabricating the MMI couplerwith the first and second edges.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention will be described in greater detail with reference to theaccompanying drawings, which relate to preferred embodiments thereof,wherein:

FIG. 1A is a schematic diagram of a rectangular 2×2 MMI coupler.

FIG. 1B is a schematic diagram of a rectangular K×M coupler.

FIG. 1C is a schematic diagram of a trapezoidal K×M coupler.

FIG. 2A is a schematic diagram illustrating a K×M MMI coupler with asegmented geometry in accordance with an embodiment of the presentinvention.

FIG. 2B is a schematic diagram illustrating a 2×2 MMI coupler inaccordance with another embodiment of the present invention.

FIG. 3 is a graph showing simulated electrical field propagation in theMMI coupler illustrated in FIG. 2B.

FIG. 4 is a graph showing simulated insertion loss for the MMI couplerillustrated in FIG. 2B.

FIG. 5 is a graph showing simulated phase error for the MMI couplerillustrated in FIG. 2B.

FIG. 6 is a schematic diagram illustrating a test structure comprising aMach Zehnder interferometer comprising a phase tuner used to drive theMMI coupler illustrated in FIG. 2B.

FIG. 7 is a graph showing optical power as a function of phase tuningpower in each of the two output ports of the MMI coupler illustrated inFIGS. 2B and 6.

FIG. 8 is a schematic diagram illustrating an arrangement for measuringcoupler power loss by cascading a number of 2×2 MMI couplers asillustrated in FIG. 2B.

FIG. 9 is a graph showing measured power loss data and a regression linefitting the data versus number of couplers in the cascaded arrangementillustrated in FIG. 8.

The drawings are not necessarily to scale, emphasis instead generallybeing placed upon illustrating the principles of the invention. In thedrawings, like numerals are used to indicate like parts throughout thevarious views.

DETAILED DESCRIPTION

A list of acronyms and their usual meanings in the present document(unless otherwise explicitly stated to denote a different thing) arepresented below.

CMOS Complementary Metal-Oxide-Semiconductor

FDTD Finite Difference Time Domain

FOM Figure of Merit

GaAs Gallium Arsenide

InP Indium Phosphide

MZI Mach Zehnder interferometer

PIC Photonic Integrated Circuits

PSO Particle Swarm Optimization

SiN Silicon nitride

SOI Silicon on Insulator

FIG. 2A illustrates a schematic diagram of a K×M MMI coupler 400 inaccordance with an embodiment of the present invention. The MMI coupler400 comprises an MMI region 411 optically coupled to a set of K (input)ports 401 ₁ to 401 _(K) at a first end 413 thereof, and to M (output)ports 402 ₁ to 402 _(M) at a second end 415 thereof opposite to thefirst end 413. Each of K and M can have any integer value greater thanzero. Each of the K ports 401 and the M ports 402 may have a respectiveouter port side for optical coupling to an optical waveguide (notshown). Each pair of adjacent input and output ports 401 and 402 isseparated by a port gap 419 with a value of D_(gap). The first andsecond ends 413 and 415 are separated by a region length 418 equal toL_(MMI), and may be perpendicular to a longitudinal (propagation) axis417 of the MMI region 411. The MMI region 411 may have a segmentedgeometry along the longitudinal axis 417 to allow more design freedomfor improving MMI coupler performance. The segmented geometry can beachieved with N different, spaced apart segment widths 416 withrespective widths W₁, W₂, W₃, W_(N-1), W_(N) perpendicular tolongitudinal axis 417. The segment widths 416 define two curved or wavyedges, a first (upper) edge 412 and a second (lower) edge 414, for theMMI region 411 between the first and second ends 413 and 415. For easierfabrication mask preparation, the shape of each of the first and secondedges 412 and 414 may be smoothed to include a plurality of peaks andvalleys with a variability limited to a range of +/−20 to +/−50% ofaverage width, +/−5% to +/−50% of average width, +/−10% to +/−25% ofaverage width, or +/−10 to +/−15% of average width.

In order to meet a desired performance requirement for the MMI coupler400, the segment widths 416 may be spaced apart equally or unequallyalong the longitudinal axis 417, the respective segment widths 416 maybe symmetrically or asymmetrically arranged on either side of a midpoint421 of the longitudinal axis 417, and the first and second edges 412 and414 may be symmetrical or asymmetrical to each other about thelongitudinal axis 417. The number N of segment widths 416 may be limitedto what is permissible by mask resolution of a fabrication processand/or by computational requirements of the software and hardwareutilized to determine the segment widths. Typical values of N for mostmaterial fabrication, e.g. 220 nm thick silicon on insulator (SOI), ofsemiconductor layers may range between 8 and 20 segment widths, whichmay be spaced apart by 0.5 μm to 2 μm, preferably about 1 μm apart, andmay have a region length 418 of between 6 μm and 12 μm. Higher values ofN may be chosen for higher values of L_(MMI).

The performance of the MMI coupler 400 can be improved by a method ofdesign and manufacturing that determines a favorable set of segmentwidths 416 W₁, W₂, W₃, . . . , W_(N-1), W_(N) corresponding to apredefined set of design parameters including values of K, M, N,L_(MMI), D_(gap), semiconductor layer composition for fabricating theMMI coupler 400, and operational wavelength band for the MMI coupler400. The semiconductor composition can be selected from conventionalcompositions, such as silicon on insulator (SOI), silicon nitride (SiN),indium phosphide (InP) or gallium arsenide (GaAs). The operationalwavelength band can be chosen from one or more of O band, E band, Sband, C band, L band, and U band. A value for D_(gap) may be assigned toexceed minimum foundry requirement, by a percentage such as 20%.

Accordingly, a step-by-step method of determining the favorable set of Nsegment widths 416 for W₁, W₂, W₃, . . . , W_(N-1), W_(N), is describedin detail herein by implementing a computerized algorithm, such as agenetic optimization algorithm or a particle swarm optimization (PSO)algorithm.

In a first step, an initial region width W_(MMI) may be defined to beequal to at least the summation of respective widths of the outer portsides of the K ports 401 ₁ to 401 _(K) plus the summation of predefinedvalues of the port gaps 419, i.e. (K—1)×D_(gap) A value for L_(MMI) canbe determined to equal a length of a conventional, e.g. rectangular,MIMI region of a width equal to W_(MMI) according to conventional, e.g.MMI self-imaging, requirements. Subsequently, a widths range for W₁, W₂,W₃, . . . , W_(N-1), W_(N) can be defined to approximate W_(MMI) withina margin of up to +1-50% of the initial region width, preferably +/−30%of the initial region width, and more preferably +/−20% of the initialregion width.

In a second step, the computer algorithm can select, e.g. by arandomization process, a set of interim widths for the plurality ofsegment widths 416. First and second interim edges are then generated bysmoothing, e.g. interpolating, the sections of the first and secondinterim edges between the segment widths 416. A computer simulation isthen performed for an MMI coupler corresponding to the set of interimwidths, the first and second edges, and the aforementioned predefinedset of design parameters, in order to determine the output opticalpowers at the M ports 402 ₁ to 402 _(M) relative to a predefined inputoptical power at an input port 401 ₁ preselected from the K ports 401.The second step may be repeated until a figure of merit (FOM) exceeds apredefined performance limit for a working set of interim widths. TheFOM may be any parameter, difference in parameters or ratio ofparameters, such as output optical power reading at one or both of the Mports 402, a ratio of the two output optical power readings, a ratio ofinput to output optical power readings, a difference between input powerand total output power etc.

The ends of the resulting segment widths 416 define points for mappingthe first and second edges 412 and 414. The points may then be joined byinterpolation and/or smoothing techniques to form a template, from whichthe first and second edges 412 and 414 may be formed. Because of theplurality of different lengths of the widths 416, the first and secondedges include a plurality, preferably more than three, of transitions inthe slope of the first and second edges 412 and 414 relative to thelongitudinal axis in the X-Y plane, excluding any intersection with thefirst and second ends 413 and 415. The transitions may take the form ofa change in curvature, i.e. the second derivative of the slope equals 0,and/or the transitions may take the form of a critical point, i.e. thefirst derivative of the slope equals 0 and a tangent is parallel to thelongitudinal axis. Typically the first and second edges 412 and 414 havevarying slopes relative to the longitudinal axis on either side of thetransition, resulting in undulating boundaries with a plurality ofpeaks, a plurality of valleys, and/or a plurality of peaks and valleys,preferably two or more each and three or more total, corresponding tothe critical points along the entire length of each of the first andsecond edges 412 and 414. Some of the points formed by the specific endsof the segment widths 416 define the local minima or maxima, i.e. whenthe end of the segment width is between two other widths, which are bothwider or both narrower resulting in a transition between positive andnegative slopes relative to the longitudinal axis. Alternatively, thepoints may be simply a transition point, i.e. when the end of thesegment width is between two other widths, in which one is narrower andone is wider.

Accordingly, an additional step may include smoothing the plurality ofpeaks and valleys in the first and second edges 412 and 424 using acomputerized interpolation algorithm to ensure the peaks and valleys arerounded and curved rather than sharp transitions. Subsequently, suchsmoothed working set of the interim widths can be set as the working setof segment widths 416. Accordingly, each MMI region 411 is divided intosegments defined at each region end by adjacent segment widths W₁ orW_(N), and at each edge by curved and smoothed out sections of the firstand second wavy edges 412 and 414.

To provide a practical example of performance improvement achievable forthe coupler 200 illustrated in FIG. 1B in accordance with the presentinvention, a set of design parameters can be predefined for an exemplaryembodiment of a coupler 500, as illustrated FIG. 2B, wherein K=M=2 andN=9 thereby giving a 2×2 3 dB MMI coupler 500 with two input ports(first and second ports 501 and 502) with outer port sides spaced apartby a port gap 522 equal to D_(gap), two output ports (third and fourthports) 503 and 504, and nine segments widths 530 equally spaced apart bya distance L_(MMI)/8 along longitudinal axis 509 of an MIMI region 511.The nine segment widths 530 define two curved or wavy edges 512 and 513for the MMI region 511 between a first region end 515 optically coupledto the first and second ports 501 and 502, and a second region end 517optically coupled to the third and fourth ports 503 and 505. An opticalpower fed into any one of the two input ports 501 and 502, may besubstantially split evenly between the two output ports 503 and 504.Respective widths of the nine width segments 530 may be symmetricallyarranged about a midpoint of the longitudinal axis 509 to form acorresponding set of nine segment widths W₁, W₂, W₃, W₄, W₅, W₄, W₃, W₂,and W₁. Such geometric symmetry may allow the MMI coupler 500 to operatesimilarly in either direction with interchangeable input port 501 and502 and output ports 503 and 504. Shapes of the two curved edges 512 and513 may include a plurality of peaks and valleys and may be symmetricalto each other about the longitudinal axis. For a more efficient guidingof the optical mode and for more smoothly transforming input/output modeprofiles, each of the first, second, third and fourth ports 501, 502,503, and 504 may include a relatively short respective tapered section531, 532, 533 and 534 bordering the MMI region 511, with a taper length521 equal to L_(taper), a first taper width bordering the nonlinear MMIregion and a second taper width at the outer port side narrower than thefirst taper width.

The aforementioned method of design and manufacturing can be applied ina similar way to the embodiment of FIG. 2B, in order to determine afinal set of nine, i.e. five different, segment widths for W₁, W₂, W₃,W₄, W₅, W₄, W₃, W₂, and W₁. The predefined design parameters can befurther defined, wherein the semiconductor composition is silicon oninsulator (SOI) with a semiconductor layer thickness of 220 nm, theoperational wavelength is from C band, L_(MMI)=8 μm, D_(gap)=0.2 μm, andthe design figure of merit (FOM) equals sum of the two output powers P₁at the third port 503 and P₂ at the fourth port 504 minus absolutedifference between the two output powers P₁ and P₂, namelyFOM=P₁+P₂−abs(P₁−P₂). Applying a particle swarm optimization (PSO)algorithm to the aforementioned set of design parameters may provide thesegment widths shown in table 1 herein.

TABLE 1 W₁ W₂ W₃ W₄ W₅ Segment Width in μm 1.60 1.59 1.45 1.50 1.44Distance in μm from the MMI region 0 1 2 3 4 first or second end

For further performance improvement of the present exemplary embodimentillustrated in FIG. 2B, a favorable set of dimensions can be defined forthe four tapered sections 531, 532, 533, and 534 by conventionalmethods, which may determine the first taper width to be equal to 0.7μm, the second taper width to be equal to 0.5 μm, and the taper lengthto be equal to 1.0 μm. A computer simulation of a 2×2 MMI coupler withthe aforementioned dimensions and design parameters may provide anFOM=0.985. Further results of the computer simulation may give theresults shown in FIGS. 3, 4 and 5 for electrical field propagation,insertion loss, and phase error respectively.

FIG. 3 shows simulated electrical field propagation from the first(left) end 515 of the coupler 500 illustrated in FIG. 2B to the second(right) end 517 thereof, using a finite difference time domain (FDTD)model. As is clearly seen from FIG. 3, the amplitude of the electricalfield at the left end 515 is evenly distributed at the right end 517with negligible scattering loss, thereby demonstrating an advantage overconventional 2×2 MMI couplers.

FIG. 4 shows simulated insertion loss of the MMI coupler 500 illustratedin FIG. 2B for a C band wavelength range, relative to an input opticalsignal at the second port 502 (p2). In FIG. 4, a curve 410 shows theinsertion loss at the third port 503 (p3), and curve 420 shows theinsertion loss at the fourth port 504 (p4). A similar insertion loss isanticipated for an input optical signal at the first port 501 (p1)instead of the second port 502 (p2). Over the entire wavelength rangeshown in FIG. 4, the excess loss, beyond the ideal insertion loss of 3dB, in either third or fourth port (p3 or p4), ranges between 0.04 dBand 0.13 dB, and approximately averages to 0.07 dB. The results of FIG.4 demonstrate a favorable balance between the third and fourth portsbranches with less than 0.1 dB difference. The MMI coupler 500 alsoprovides favorable broadband performance, with less than 0.1 dBvariation across the entire C-band wavelength range.

FIG. 5 shows simulated phase error simulation for the MMI coupler 500illustrated in FIG. 2B for a C band wavelength range. As seen from FIG.5, phase difference between an input and an optical signal is favorablyclose to the ideal difference of 90-degree, within an error of less than0.6 degree across the entire C-band wavelength range, therebydemonstrating an advantage over conventional 2×2 MMI couplers.

To perform experimental tests on a 2×2 MMI coupler 500 as illustrated inFIG. 2B and fabricated with the aforementioned characteristics, a teststructure 60 as illustrated in FIG. 6 can be used to drive the MMIcoupler 500. The test structure 60 can include a Mach Zehnderinterferometer (MZI) 60 comprising a phase tuner 61 for measuring powerimbalance and phase error of the MMI coupler 500 from the MZI spectrumextinction ratio.

FIG. 7 is a graph of the optical power in each of the third (bottom)port 503 and fourth (top) port 504 of the MMI coupler 500 illustrated inFIGS. 2B and 6 as a function of phase tuning power at the second port502. As seen from FIG. 7, the extinction ratio is about 45 dB for bothtop and bottom ports, indicating a power imbalance of approximately 0.1dB. By comparing phases of the top and bottom ports, the measured phaseerror is approximately 1 degree.

Insertion loss of a 2×2 MMI coupler can be more accurately determined bycascading a number of similar couplers optically coupled in a tandemarrangement as illustrated in FIG. 8, measuring a combined loss of thecascaded couplers and dividing the measured combined loss by the numberof cascaded couplers. Such cascaded structures can provide a teststructure for being embedded in the spare space of a large-scaleintegrated system to enable MMI device characterizations in a waferscale fabrication.

As illustrated in FIG. 8, a first 2×2 MMI coupler 80 including lower andupper output ports 83 and 84, respectively, can be cascaded with asecond 2×2 MMI coupler 90 including lower and upper input ports 91 and92, respectively. In the cascading arrangement illustrated in FIG. 8,the lower output port 83 may be in optical communication with the upperinput port 92 via an optical carrier 85, which can be an opticalwaveguide. Alternatively, the lower output port 83 and the upper inputport 92 can be positioned sufficiently close to each other to be indirect optical communication. In another cascading arrangement, theupper output port 84 can be directly connected to the upper input port92, with port 83 connected to port 91 in the meanwhile. The arrangementillustrated in FIG. 8 can be replicated to cascade as many additionalcouplers as required, by providing optical communication between a loweroutput of any cascaded coupler and an upper input port of a nextsuccessive coupler.

FIG. 9 is a graph showing measurement data and a regression line to fitthe measurement data for the loss in delivered power at a wavelengtharound 1550 nm in a set of cascaded couplers as shown in FIG. 8, versusnumber of the cascaded couplers. The regression line indicates anaverage measured loss in delivered power per a single coupler ofapproximately 0.11 dB.

The aforementioned results demonstrate, in combination, that within afootprint of 9.4×1.6 μm², less than 0.1 dB power imbalance, less than 1degree phase error and less than 0.2 dB excess optical loss can beachieved across the entire C-band. This indicates that a 2×2 MMIdesigned and manufactured in in accordance with the present invention,promises an improved performance in terms of power loss, power balance,and phase error.

In general, K×M MMI couplers with greater than 2 values for K, M or bothK and M, can be designed and fabricated for an improved performance by adirect extension of the aforementioned methods and principles describedfor the 2×2 MMI coupler embodiment of the present invention.

Although experimental results are described herein for a wavelengthrange related to conventional C band, an MMI coupler can be designed,constructed, simulated and subjected to experimental measurements forother wavelength ranges selected from the group of O band, E band, Sband, L band, and U band listed in Table II herein, in accordance withthe aforementioned principles and methods.

TABLE II Band Description Wavelength Range O band original 1260 to 1360nm E band extended 1360 to 1460 nm S band short wavelengths 1460 to 1530nm C band conventional (“erbium window”) 1530 to 1565 nm L band longwavelengths 1565 to 1625 nm U band ultralong wavelengths 1625 to 1675 nm

While the present invention has been particularly shown and describedwith reference to the preferred mode as illustrated in the drawing, itwill be understood by one skilled in the art that various changes indetail may be affected therein without departing from the spirit andscope of the invention as defined by the claims.

Any patent, patent application, patent application publication, journalarticle, book, published paper, or other publicly available materialidentified in the specification is hereby incorporated by referenceherein in its entirety. Any material, or portion thereof, that is saidto be incorporated by reference herein, but which conflicts withexisting definitions, statements, or other disclosure materialexplicitly set forth herein is only incorporated to the extent that noconflict arises between that incorporated material and the presentdisclosure material. In the event of a conflict, the conflict is to beresolved in favor of the present disclosure as the preferred disclosure.

We claim:
 1. A multimode interference coupler comprising: a multimodeinterference (MMI) region including: first and second region endsseparated by a region length along a longitudinal axis, and first andsecond undulating edges between the first and second region ends,defining the MMI region, which varies in width along the region length;wherein each of the first and second undulating edges includes aplurality of peaks and valleys; at least one port optically coupled tothe first region end; and at least one port optically coupled to thesecond region end; wherein the plurality of peaks and valleys comprisesat least three peaks and at least two valleys in each of the first andsecond edges.
 2. The coupler according to claim 1, wherein the MMIregion includes a plurality of different widths, perpendicular to thelongitudinal axis, each width corresponding to one of the plurality ofpeaks and valleys or other transition, spaced apart along the regionlength, defining adjacent segments; and wherein the first and secondundulating edges provide gradual transitions between the differentwidths.
 3. The coupler according to claim 2, wherein the plurality ofdifferent widths correspond to 5 to 20 peaks and valleys spaced alongeach of the first and second edges.
 4. The coupler of claim 3, whereinthe plurality of different widths are equally spaced along thelongitudinal axis.
 5. The coupler of claim 4, wherein the plurality ofdifferent widths are symmetrical about a midpoint of the longitudinalaxis.
 6. The coupler of claim 2, wherein each of the at least one portoptically coupled to the first and second region ends comprises twoports, wherein the first and second undulating edges are symmetrical toeach other about the longitudinal axis; wherein the plurality ofdifferent widths corresponding to 5 to 20 peaks and valleys or othertransitions spaced along each of the first and second undulating edges;and whereby light entering one of the two ports optically coupled to thefirst region end is substantially equally split into the two portsoptically coupled to the second region end.
 7. The coupler of claim 6,wherein each of the plurality of different widths is 1.5 μm+/−10%. 8.The coupler of claim 7, wherein the two ports coupled to the firstregion end are spaced apart by a first port gap; wherein the two portscoupled to the second region end are spaced apart by a second port gap;and wherein the first port gap=the second port gap=0.2 μm+/−50%.
 9. Thecoupler of claim 8, wherein each of the ports coupled to the first andsecond region ends comprises: a respective outer port side for opticalcoupling to an optical waveguide; and tapered section with a taperlength equal to 1.0 μm+/−50%, a first taper width bordering themultimode interference region equal to 0.7 μm+/−20%, and a second taperwidth at the outer port side equal to 0.5 μm+/−20%.
 10. A multimodeinterference coupler comprising: a multimode interference (MMI) regionincluding: first and second region ends separated by a region lengthalong a longitudinal axis, and first and second undulating edges betweenthe first and second region ends, defining the MMI region, which variesin width along the region length; wherein each of the first and secondundulating edges includes a plurality of peaks and valleys; at least oneport optically coupled to the first region end; and at least one portoptically coupled to the second region end; wherein the plurality ofpeaks and valleys comprise at least two peaks and at least three valleysin each of the first and second edges.
 11. A method of manufacturing amultimode interference (MMI) coupler comprising: a multimodeinterference (MMI) region including: first and second region endsseparated by a region length along a longitudinal axis, and first andsecond undulating edges between the first and second region ends,defining the MMI region, which varies in width along the region length,each of the first and second undulating edges including a plurality ofpeaks and valleys; at least one port optically coupled to the firstregion end; and at least one port optically coupled to the second regionend, said method comprising: determining the first and second undulatingedges for a predefined set of design parameters, using a computerizedoptimization algorithm; and fabricating the MMI coupler with the firstand second edges; wherein determining the first and second undulatingedges comprises: a) generating a set of between 8 to 20 region widths,perpendicular to and spaced apart along the longitudinal axis,corresponding to between 5 and 20 peaks and valleys and othertransition, using the computerized optimization algorithm, therebyforming first and second interim edges; and b) smoothing the first andsecond interim edges to generate the first and second undulating edgesincluding at least two valleys and at least three peaks in each of thefirst and second undulating edges.
 12. The method according to claim 11,wherein determining the first and second undulating edges comprises: i)randomly generating a set of interim region widths, perpendicular to andspaced apart along the longitudinal axis, corresponding to the pluralityof peaks and valleys and other transitions, within a predefined widthsrange approximate to a predefined initial region width, using thecomputerized optimization algorithm, thereby forming first and secondinterim edges; ii) smoothing the first and second interim edges; iii)determining output optical power at each of the ports optically coupledto the second region end relative to a predefined input optical power atone of the ports optically coupled to the first region end, bysimulating the MMI coupler for the set of interim widths and thepredefined set of design parameters; iv) calculating a figure of meritfrom the output optical powers and the predefined input optical power;v) repeating steps i) to iv) until the figure of merit exceeds apredefined performance limit for a working set of interim widths; andvi) setting the working set of interim widths as the set of regionwidths.
 13. The method of claim 12, wherein the step of smoothing thefirst and second interim edges comprises interpolating the working setof interim widths, using a computerized interpolation algorithm.
 14. Themethod of claim 11, wherein the computerized optimization algorithmcomprises one of a particle swarm optimization algorithm and a geneticoptimization algorithm.
 15. The method of claim 11, further comprisingsetting the predefined widths range to between 80% and 120% of thepredefined initial region width.
 16. The method of claim 11, wherein thepredefined set of design parameters comprises one or more parametersselected from the group consisting of: region length; numbers of ports;a semiconductor layer composition selected from the group consisting ofSOI, SiN, Silicon on Saphire, InP, and GaAs; and an operationalwavelength band selected from of the group consisting of O band, E band,S band, C band, L band, and U band.
 17. The method of claim 11, furthercomprising measuring insertion loss of the MMI coupler by a teststructure embedded within a large-scale integrated system, wherein thetest structure comprises a cascade of a plurality of test couplerssimilar to the MMI coupler, optically coupled in a tandem arrangement.